Advanced Structural Investigations of Anisotropic van der Waals Epitaxy of CsPbBr3 Microplatelets on ReSe2 using Aberration Corrected TEM/STEM.
- Abstract number
- 256
- Presentation Form
- Poster
- Corresponding Email
- [email protected]
- Session
- Poster Session One
- Authors
- Olga Brontvein (1), Noya R. Itzhak (1), Ernesto Joselevich (1)
- Affiliations
-
1. Weizmann Institute of Science
- Keywords
TEM, STEM, microplatelet, CsPbBr3
- Abstract text
The fabrication of nanodevices is a fast developing field, which require ability to grow highly crystalline nanostructures with a good control on their dimensions and properties. The ability to grow well-aligned and guided nanowires by using covalent epitaxy and graphoepitaxy relations between those nanowires and substrates enhancers the ability to fabricate complicate nanodevices.
However, these epitaxial relations could induce strain and stress in the nanocrystals, and as a result could cause dislocations and other defects, which affect the physical and electronic properties of nanostructures.
This work focusing on advanced structural analysis of cubic CsPbBr3 micro- and nano-platelets that were grown on 2D layered triclinic ReSe2 substrate. The crystallographic orientation of a platelets vs substrate and stresses induced by vdW epitaxy were investigated.
These results helped bettered understanding of formation mechanism and substrate -microplatelet relations. In addition, it opens a route for the ordered design of heterostructure devices with improved optical and electrical properties due to the lower miss-match stresses induced by vdW vs. covalent epitaxy.